Resonant surface second harmonic generation from An films on NaCl(100)

被引:7
作者
Kitahara, T
Tanaka, H
Nishioka, Y
Mizutani, G [1 ]
机构
[1] Japan Adv Inst Sci & Technol, Sch Mat Sci, Tatsunokuchi, Ishikawa 9231292, Japan
[2] Japan Sci & Technol Corp, PRESTO, Fields & React, Kawaguchi, Saitama 3320012, Japan
来源
PHYSICAL REVIEW B | 2001年 / 64卷 / 19期
关键词
D O I
10.1103/PhysRevB.64.193412
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have found that the resonance energy of optical second-harmonic (SH) generation from An films on NaCl(100) depends strongly on the film thickness. The resonance peak of the SH intensity was found at 2 (h) over bar omega = 3.2 eV for the island film of mean thickness 0.4 mn, while it appeared at 2 (h) over bar omega = 2.4 eV for the continuous film of thickness 40 nm. We suggest that the SH intensity peak observed at 2 (h) over bar omega = 3.2 eV originates from a resonant transition from occupied to unoccupied electronic levels of the (100) surface on top of the An islands. The SH intensity peak observed at 2 (h) over bar omega = 2.4 eV for the film thickness of 40 nm originates from the roughness-induced linear dielectric property of the film.
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页数:4
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