Giant positive magnetoresistance of Bi nanowire arrays in high magnetic fields

被引:54
作者
Hong, KM [1 ]
Yang, FY
Liu, K
Reich, DH
Searson, PC
Chien, CL
Balakirev, FF
Boebinger, GS
机构
[1] Johns Hopkins Univ, Baltimore, MD 21218 USA
[2] AT&T Bell Labs, Lucent Technol, Murray Hill, NJ 07974 USA
[3] Univ Calif Los Alamos Natl Lab, Los Alamos, NM 87545 USA
关键词
D O I
10.1063/1.370215
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have studied the magnetoresistance of electrodeposited Bi wires with diameters between 200 nm and 2 mu m in magnetic fields up to B = 55 T. In zero field, the resistance increases with decreasing temperature, indicating that the mean free path is strongly influenced by the nanowire geometry. The high-field magnetoresistance shows strong dependence on field orientation; typically 200% for B parallel to the wires, and 600%-800% for B perpendicular to the wires. The perpendicular magnetoresistance is well described by a modified two-current model which suggests that the high-field response of the arrays is fairly insensitive to the wire diameter, and is dominated by bulk properties of Bi. (C) 1999 American Institute of Physics. [S0021-8979(99)69908-X].
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页码:6184 / 6186
页数:3
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