Photoinduced NO release by visible light irradiation from pyrazi-bridged nitrosyl ruthenium complexes

被引：83

作者：

Sauaia, MG

de Lima, RG

Tedesco, AC

da Silva, RS

机构：

[1] Univ Sao Paulo, Dept Quim, Fac Filosofia Ciencias & Letras Ribeirao Preto, BR-14040901 Ribeirao Preto, SP, Brazil

[2] Univ Sao Paulo, Fac Ciencias Farmaceut Ribeirao Preto, BR-14040903 Ribeirao Preto, SP, Brazil

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2003年 / 125卷 / 48期

关键词：

D O I：

10.1021/ja0376801

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The binuclear complex [RuII(NH3)5(pz)RuII(bpy)2(NO)](PF6)5 was prepared and characterized by elemental analysis, UV?vis, and IR spectroscopy. The complex UV?vis spectrum has presented bands at 242, 286, and 530 nm in acetate buffer solution at pH 4.5. The photochemical study by laser flash-photolysis at 532 nm showed the NO release account from the NO measured by a NO sensor. The quantum yield for NO release (0.025 ± 0.004 mol einsten-1) was determined with a laser flash-photolysis apparatus (Continuum Q-switched Nd:YAG laser). The major irradiation product of the [RuII(NH3)5(pz)RuII(bpy)2(NO)]5+ complex besides nitric oxide is [RuIII(NH3)5(pz)RuII(bpy)2(H2O)]5+. Copyright © 2003 American Chemical Society.

引用

页码：14718 / 14719

页数：2

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