Maskless photoencoded selective etching for glass-based microtechnology applications

被引：7

作者：

Kyung, JH ^{[1
]}

Lawandy, NM ^{[1
]}

机构：

[1] BROWN UNIV,DIV ENGN,PROVIDENCE,RI 02912

来源：

OPTICS LETTERS | 1996年 / 21卷 / 03期

关键词：

D O I：

10.1364/OL.21.000174

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Two-photon excitation of carriers in boron E'-center-containing borosilicate glasses results in a photoencoding of selectively etchable regions. Using a turbulent etching process followed by polishing, we have demonstrated a number of patterning capabilities for microtechnology applications such as ultrafast capillary electrophoresis chips and rapid prototyping of diffractive optical elements. (C) 1996 Optical Society of America

引用

页码：174 / 176

页数：3