Hole trapping in molecularly doped polymers: The Hoesterey-Letson formalism

被引:9
作者
Borsenberger, PM [1 ]
Gruenbaum, WT
Magin, EH
Schildkraut, DE
Visser, SA
机构
[1] Eastman Kodak Co, Off Imaging Div, Rochester, NY 14650 USA
[2] Eastman Kodak Co, Imaging Res & Adv Dev, Rochester, NY 14650 USA
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 1A期
关键词
hole trapping; molecularly doped polymers;
D O I
10.1143/JJAP.38.117
中图分类号
O59 [应用物理学];
学科分类号
摘要
Hole trapping has been investigated in di-p-anisyl-p -tolylamine (DAT), tri-p-tolylamine (TTA), di-p-toiylphenylamine (DTP), and diphenyl-p-tolylamine (DPT) doped poly(styrene) containing different concentrations of tri-p-anislyamine (TAA). From oxidation potential measurements, TAA is a trap for DAT. TTA, DTP, and DPT with depths 0.07, 0.22. 0.27, and 0.34 eV. respectively. In such a way, it is possible to investigate the effect of trap depth using the same trap molecule. The mobilities decrease with increasing trap depth and concentration. For a TAA molar concentration of 10(-2), the room temperature mobilities are suppressed by as much as four orders of magnitude. The results are compared to predictions of the Hoesterey-Letson formalism and discussed within the framework of the recent simulations of Wolf et al. [Chem. Phys. 222 (1997) 259] and Borsenberger et al. (submitted to Chem. Phys.).
引用
收藏
页码:117 / 121
页数:5
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