Fractal growth of copper in a gel medium

被引：16

作者：

Bandyopadhyay, S ^{[1
]}

Roy, S ^{[1
]}

Chakravorty, D ^{[1
]}

机构：

[1] JAWAHARLAL NEHRU CTR ADV SCI RES,BANGALORE 560064,KARNATAKA,INDIA

来源：

SOLID STATE COMMUNICATIONS | 1996年 / 99卷 / 11期

关键词：

D O I：

10.1016/0038-1098(96)00326-2

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Fractal growth of electrodeposited copper in a gel medium with different concentrations of copper ions has been studied. The fractal dimensions (d(f)) show a periodic variation as a function of voltage with the values varying from 2.0 to 1.75. The behaviour is explained on the basis of two mechanisms, viz. generalized diffusion limited aggregation and dielectric breakdown. Electron micrographs of the samples indicate that the clusters consist of metallic copper having dimensions in the range 6.2-20.8 nm. Metal particle size can be varied by changing the applied voltage. Copyright (C) 1996 Published by Elsevier Science Ltd.

引用

页码：835 / 838

页数：4

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