Resonant Raman scattering in polycrystalline silicon thin films

被引:69
作者
Paillard, V
Puech, P
Laguna, MA
Temple-Boyer, P
Caussat, B
Couderc, JP
de Mauduit, B
机构
[1] Univ Toulouse 3, Phys Solides Lab, CNRS, F-31062 Toulouse, France
[2] CNRS, LAAS, F-31077 Toulouse 4, France
[3] ENSI Genie Chim, CNRS, Lab Genie Chim, F-31078 Toulouse, France
[4] CNRS, CEMES, F-31055 Toulouse, France
关键词
D O I
10.1063/1.122256
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this letter, we report the results obtained on polycrystalline silicon thin films using Raman spectrometry in resonance with the silicon direct band gap. First, we show that accurate information about crystallites can be obtained in these experimental conditions, without any deconvolution of Raman spectra. Second, we apply the technique to estimate the mechanical stress of polycrystalline silicon thin films. (C) 1998 American Institute of Physics.
引用
收藏
页码:1718 / 1720
页数:3
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