Electronic properties of interfaces and defects from many-body perturbation theory: Recent developments and applications

被引:66
作者
Giantomassi, M. [1 ,2 ]
Stankovski, M. [1 ,2 ]
Shaltaf, R. [1 ,3 ]
Gruning, M. [1 ,4 ,5 ]
Bruneval, F. [1 ,6 ]
Rinke, P. [1 ,7 ]
Rignanese, G. -M. [1 ,2 ]
机构
[1] Catholic Univ Louvain, ETSF, B-1348 Louvain, Belgium
[2] Catholic Univ Louvain, Inst Condensed Matter & Nanosci, B-1348 Louvain, Belgium
[3] Univ Jordan, Dept Phys, Amman 11942, Jordan
[4] Univ Coimbra, Ctr Computat Phys, P-3004516 Coimbra, Portugal
[5] Univ Coimbra, Dept Phys, P-3004516 Coimbra, Portugal
[6] CEA, DEN, Serv Rech Met Phys, F-91191 Gif Sur Yvette, France
[7] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
来源
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS | 2011年 / 248卷 / 02期
关键词
defect levels; electronic structure calculations; interfaces; PARTICLE BAND-STRUCTURE; DENSITY FUNCTIONALS; GW APPROXIMATION; GREENS-FUNCTION; SELF-ENERGY; PHOTOEMISSION; SILICON; SEMICONDUCTORS; OFFSETS; FILMS;
D O I
10.1002/pssb.201046094
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We review some recent developments in many body perturbation theory (MBPT) calculations that have enabled the study of interfaces and defects. Starting from the theoretical basis of MBPT, Hedin's equations are presented, leading to the CW and CWI' approximations. We introduce the perturbative approach, that is the one most commonly used for obtaining quasiparticle (QP) energies. The practical strategy presented for dealing with the frequency dependence of the self energy operator is based on either plasmon-pole models (PPM) or the contour deformation technique, with the latter being more accurate. We also discuss the extrapolar method for reducing the number of unoccupied states which need to be included explicity in the calculations. The use of the PAW method in the framework of MBPT is also described. Finally, results which have been obtained using, MBPT for band offsets a interfaces and for defects presented, with companies on the main difficulties and cancels. Schematic representation of the QP corrections (marked with ) to the band edges (E and E-v) and a defect level (F) for a Si/SiO2 interface (Si and O atoms are represented in blue and red, respectively, in the ball and stick model) with an oxygen vacancy leading to a Si-Si bond (the Si atoms involved in this bond are colored light blue).
引用
收藏
页码:275 / 289
页数:15
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