Photoresist development modeling based on continuity equations

In this paper, we propose a model to simulate photoresist development based on continuity equations. In the resist dissolution process, to consider different components (Developer, Resist, Reaction By-product ect.), each component's local concentration is described by the continuity equation. The resist development process is viewed as the diffusion-reaction process of all components involved in the dissolution process. A simulation program has been written based on the above concept. The simulation for different previous existing models are discussed.