The magnetic properties of FePd ultrathin films and their variation under the influence of an electric field are investigated by magneto-optical Kerr effect (MOKE) measurements. L1(0)-ordered FePd shows a spin reorientation transition when varying the thickness. The easy axis of magnetization is found to be normal to the plane at thicknesses above 9 monolayers (MLs) and in-plane below 9 ML. The coercive field, the perpendicular magnetic anisotropy and the MOKE signal at saturation vary with the applied electric field. The sensitivity of the interface magnetic anisotropy is estimated to be 602 fJ/V m. (C) 2011 American Institute of Physics. [doi:10.1063/1.3599492]
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Coll William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
CSIC, CNM, Inst Microelect, Madrid, SpainColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Clavero, C.
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Skuza, J. R.
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Coll William & Mary, Dept Phys, Williamsburg, VA 23187 USAColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Skuza, J. R.
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Choi, Y.
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Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USAColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Choi, Y.
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Haskel, D.
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Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USAColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Haskel, D.
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Garcia-Martin, J. M.
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CSIC, CNM, Inst Microelect, Madrid, SpainColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Garcia-Martin, J. M.
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Cebollada, A.
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CSIC, CNM, Inst Microelect, Madrid, SpainColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Cebollada, A.
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Lukaszew, R. A.
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Coll William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Coll William & Mary, Dept Phys, Williamsburg, VA 23187 USAColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
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E China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China
Duan, Chun-Gang
;
Velev, Julian P.
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Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China
Velev, Julian P.
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Sabirianov, R. F.
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Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USA
Univ Nebraska, Dept Phys, Omaha, NE 68182 USAE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China
Sabirianov, R. F.
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Zhu, Ziqiang
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E China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China
Zhu, Ziqiang
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Chu, Junhao
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E China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China
Chu, Junhao
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Jaswal, S. S.
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Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China
Jaswal, S. S.
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Tsymbal, E. Y.
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Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China
机构:
Coll William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
CSIC, CNM, Inst Microelect, Madrid, SpainColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Clavero, C.
;
Skuza, J. R.
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Coll William & Mary, Dept Phys, Williamsburg, VA 23187 USAColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Skuza, J. R.
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Choi, Y.
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Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USAColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Choi, Y.
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Haskel, D.
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Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USAColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Haskel, D.
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Garcia-Martin, J. M.
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CSIC, CNM, Inst Microelect, Madrid, SpainColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Garcia-Martin, J. M.
;
Cebollada, A.
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CSIC, CNM, Inst Microelect, Madrid, SpainColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Cebollada, A.
;
Lukaszew, R. A.
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Coll William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
Coll William & Mary, Dept Phys, Williamsburg, VA 23187 USAColl William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
机构:
E China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China
Duan, Chun-Gang
;
Velev, Julian P.
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Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China
Velev, Julian P.
;
Sabirianov, R. F.
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Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USA
Univ Nebraska, Dept Phys, Omaha, NE 68182 USAE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China
Sabirianov, R. F.
;
Zhu, Ziqiang
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E China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China
Zhu, Ziqiang
;
Chu, Junhao
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E China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China
Chu, Junhao
;
Jaswal, S. S.
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Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China
Jaswal, S. S.
;
Tsymbal, E. Y.
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Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USAE China Normal Univ, Minist Educ, Key Lab Polarized Mat & Devices, Shanghai 200062, Peoples R China