Oxygen Non-Stoichiometry in Nano-crystalline La0.5Sr0.5CoO3-x Thin Films

被引：2

作者：

Wang, S. ^{[1
]}

Cho, S. ^{[2
]}

Wang, H. ^{[2
]}

Jacobson, A. J. ^{[1
]}

机构：

[1] Univ Houston, Dept Chem, Univ Pk, Houston, TX 77204 USA

[2] Texas A&M Univ, Dept Elect Engn, College Stn, TX 77843 USA

来源：

SOLID OXIDE FUEL CELLS 12 (SOFC XII) | 2011年 / 35卷 / 01期

关键词：

ELECTRODES; KINETICS; SOFC;

D O I：

10.1149/1.3570178

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Nano-crystalline La0.5Sr0.5CoO3-x (LSCO) thin films with a thickness of similar to 400 nm were deposited on a polycrystalline CGO substrate using pulsed laser deposition. AC impedance measurements were performed on symmetric cells between 400-600 degrees C in 0.01 <= pO(2) <= 1 atm. The oxygen non-stoichiometry in LSCO thin films was obtained by utilizing a hypothetical cell where oxygen transport was limited by the surface exchange reaction. It was found that the oxygen non-stoichiometry was about one order of magnitude lower than that observed for bulk LSCO. At 600 degrees C, in air, the area specific resistance (ASR) of the LSCO thin film is about 0.06 ohm cm(2).

引用

页码：1891 / 1897

页数：7

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