Electron transport in ZnO thin films

被引:119
作者
Makino, T [1 ]
Segawa, Y
Tsukazaki, A
Ohtomo, A
Kawasaki, M
机构
[1] Univ Hyogo, Grad Sch Mat Sci, Hyogo 6781297, Japan
[2] RIKEN, Inst Phys & Chem Res, Photodynam Res Ctr, Aoba Ku, Sendai, Miyagi 9800845, Japan
[3] Tohoku Univ, Mat Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
[4] Combinatorial Explorat Mat Sci & Technol, Tsukuba, Ibaraki, Japan
关键词
D O I
10.1063/1.1991994
中图分类号
O59 [应用物理学];
学科分类号
摘要
Epitaxial n-type ZnO films grown by a laser molecular-beam epitaxy method were investigated by the temperature-dependent Hall-effect technique. The 300 K carrier concentration and mobility were about n(s) similar to 10(16) cm(-3) and 440 cm(2)/V s, respectively. Transport characteristics are calculated by solving the Boltzmann transport equation using a variational method. Mobility limit of 430 cm(2)/V s was calculated at 300 K. The temperature dependence of the mobility for an undoped film is calculated and agrees favorably well with experimental data if physical parameters are chosen so as to approach those. In the experimental "mobility versus concentration" curve, unusual phenomenon was observed, i.e., mobilities at n(s) similar to 5 x 10(18) cm(-3) are significantly smaller than those at higher densities above similar to 10(20) cm(-3). It is qualitatively explained in terms of electron-plasmon interaction. (c) 2005 American Institute of Physics.
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