A review of chemical vapour deposition of graphene on copper

被引:1179
作者
Mattevi, Cecilia [1 ]
Kim, Hokwon [1 ]
Chhowalla, Manish [1 ,2 ]
机构
[1] Univ London Imperial Coll Sci Technol & Med, Dept Mat, London SW7 2AZ, England
[2] Rutgers State Univ, Piscataway, NJ 08854 USA
关键词
INDIUM-TIN-OXIDE; LARGE-AREA; EPITAXIAL GRAPHENE; TRANSPARENT ELECTRODES; SUSPENDED GRAPHENE; GRAPHITE FORMATION; FERRIC-CHLORIDE; CARBON-FILMS; 100; SURFACE; THIN-FILMS;
D O I
10.1039/c0jm02126a
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The discovery of uniform deposition of high-quality single layered graphene on copper has generated significant interest. That interest has been translated into rapid progress in terms of large area deposition of thin films via transfer onto plastic and glass substrates. The opto-electronic properties of the graphene thin films reveal that they are of very high quality with transmittance and conductance values of >90% and 30 Omega/sq, both are comparable to the current state-of-the-art indium tin oxide transparent conductor. In this Feature Article, we provide a detailed and up to date description of the literature on the subject as well as highlighting challenges that must be overcome for the utilization of graphene deposited on copper substrates by chemical vapour deposition.
引用
收藏
页码:3324 / 3334
页数:11
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