Moving mask LIGA (M2LIGA) process for control of side wall inclination

被引：41

作者：

Tabata, O ^{[1
]}

Terasoma, K ^{[1
]}

Agawa, N ^{[1
]}

Yamamoto, K ^{[1
]}

机构：

[1] Ritsumeikan Univ, Noji Higashi, Shiga 5258577, Japan

来源：

MEMS '99: TWELFTH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST | 1999年

关键词：

D O I：

10.1109/MEMSYS.1999.746826

中图分类号：

TP [自动化技术、计算机技术];

学科分类号：

0812 ;

摘要：

The side wall inclination of a PMMA microstructure fabricated by deep X-ray lithography have been controlled by moving a X-ray mask in parallel with a PMMA substrate during X-ray exposure. In order to demonstrate the feasibility of this moving mask technology, various conical shape and truncated conical shape microstructures with height of 100 - 300 mu m and a diameter of the top and the bottom of truncated conical structures between 0 - 310 mu m were fabricated.

引用

页码：252 / 256

页数：5

共 3 条

[1] Deep submicron resist profile simulation and characterization of electron beam lithography system for cell projection and direct writing [J].