Pulsed laser deposition of ferroelectric (Na0.5K0.5)NbO3-based thin films

被引:41
作者
Saito, T [1 ]
Adachi, H [1 ]
Wada, T [1 ]
机构
[1] Ryukoku Univ, Dept Chem Mat, Otsu, Shiga 5202194, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2005年 / 44卷 / 16-19期
关键词
ferroelectric; sodium niobate; potassium niobate; thin film; pulsed laser deposition; epitaxial film;
D O I
10.1143/JJAP.44.L573
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ferroelectric (Na0.52K0.44Li0.04)(Nb0.84Ta0.10Sb0.06)O-3 thin films were epitaxially grown on a (100)SrRuO3//(100)SrTiO3 substrate by pulsed laser deposition. Crystallographic analysis of the film was performed using conventional X-ray diffraction analysis and rocking curve measurements. Hi.-h resolution X-ray diffraction reciprocal space map was also measured to analyze the crystallographic relationship between the grown film and the SrTiO3 substrate and to determine the strain state of the film. The full width at half maximum of the rocking curve was as small as 0.19 degrees and the determined pseudo-tetragonal lattice parameters were a = 3.947 angstrom and c = 3.955 angstrom. The P-E hysteresis loop of the film was characteristic of ferroelectric behavior.
引用
收藏
页码:L573 / L575
页数:3
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