Novel fabrication method for Si1-xTixO2 thin films with graded composition profiles by liquid phase deposition

被引：18

作者：

Deki, S ^{[1
]}

Iizuka, S ^{[1
]}

Akamatsu, K ^{[1
]}

Mizuhata, M ^{[1
]}

Kajinami, A ^{[1
]}

机构：

[1] Kobe Univ, Fac Engn, Dept Sci & Chem Engn, Nada Ku, Kobe, Hyogo 6578501, Japan

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2001年 / 11卷 / 04期

关键词：

D O I：

10.1039/b100615k

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A novel technique for the direct synthesis of Si1-xTixO2 thin films with graded composition profiles has been studied in aqueous solution, in which the (NH4)(2)SiF6 solutions were added into the (NH4)(2)TiF6 master solution under time- and rate-controlled reaction conditions: the composition of the films in the direction of the film thickness was successfully controlled over a wide range by this technique.

引用

页码：984 / 986

页数：3

共 18 条

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