共 10 条
- [1] Bennett J.M., 1989, INTRO SURFACE ROUGHN
- [2] BOWER RW, 1995, ELECT SOC P SERIES P, V3, P107
- [3] CARREJO JP, 1991, J VAC SCI TECHNOL B, V9, P255
- [4] QUANTITATIVE MICROROUGHNESS ANALYSIS DOWN TO THE NANOMETER-SCALE [J]. EUROPHYSICS LETTERS, 1993, 22 (09): : 717 - 722
- [5] GOSELS U, 1993, SEMICONDUCTOR WAFER, P395
- [6] ROLE OF SURFACE-MORPHOLOGY IN WAFER BONDING [J]. JOURNAL OF APPLIED PHYSICS, 1991, 69 (01) : 257 - 260
- [7] PEITGEN HO, 1988, SCI FRACTAL IMAGES, pCH1
- [8] SILICON ROUGHNESS INDUCED BY PLASMA-ETCHING [J]. JOURNAL OF APPLIED PHYSICS, 1994, 75 (11) : 7498 - 7506
- [9] *TOP CORP, 1994, TOP US MAN VERS 3 0
- [10] ROUGHNESS ASSESSMENT OF POLYSILICON USING POWER SPECTRAL DENSITY [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (12A): : 5671 - 5674