Deposition mechanism of sputtered amorphous carbon nitride thin film

被引：15

作者：

Durand-Drouhin, O ^{[1
]}

Benlahsen, M ^{[1
]}

Clin, M ^{[1
]}

Bouzerar, R ^{[1
]}

机构：

[1] Fac Sci Amiens, Phys Mat Condensee Lab, F-80039 Amiens 2, France

来源：

APPLIED SURFACE SCIENCE | 2004年 / 223卷 / 04期

关键词：

disordered systems; surface and interfaces; thin films; atom; molecule; ion impact;

D O I：

10.1016/j.apsusc.2003.09.017

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We report in this study a deposition mechanism that describes the interaction of plasma species with the growing amorphous carbon nitride film (a-CNx). The samples were deposited by radio frequency (rf) magnetron sputtering on crystalline silicon, under different values of RF power. Plasma characterisation was performed using mass spectroscopy (MS) and the influence of the process parameters on the chemical fragmentation of species, present in the plasma, was investigated. Nitrogen incorporation in the a-CNx films was analyzed using nuclear reaction analysis (NRA) measurements correlated with Fourier transform infrared spectroscopy (FTIR) results. The deposition mechanism proposed in this work can well describe surface processes and the resulting composition and chemical bonding of the deposited a-CNx films. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：269 / 274

页数：6

共 21 条

[1]

Campbell D. S., 1970, HDB THIN FILM TECHNO, P12

[2] Vibrational properties of carbon nitride films by Raman spectroscopy [J].

Chowdhury, AKMS ;

Cameron, DC ;

Hashmi, MSJ .

THIN SOLID FILMS, 1998, 332 (1-2) :62-68

[3] Effect of target self-bias on carbon nitride thin films deposited by RF magnetron sputtering [J].

Durand-Drouhin, O ;

Lejeune, M ;

Clin, M ;

Ballutaud, D ;

Benlahsen, M .

SOLID STATE COMMUNICATIONS, 2001, 118 (04) :179-182

[4] Ion beam deposited carbon nitride films: Characterization and identification of chemical sputtering [J].

Hammer, P ;

Baker, MA ;

Lenardi, C ;

Gissler, W .

THIN SOLID FILMS, 1996, 290 :107-111

[5] Hydrogen induced changes on the electronic structure of carbon nitride films [J].

Hammer, P ;

Victoria, NM ;

Alvarez, F .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1998, 227 :645-649

[6] Effect of chemical sputtering on the growth and structural evolution of magnetron sputtered CNx thin films [J].

Hellgren, N ;

Johansson, MP ;

Broitman, E ;

Sandström, P ;

Hultman, L ;

Sundgren, JE .

THIN SOLID FILMS, 2001, 382 (1-2) :146-152

[7] Role of nitrogen in the formation of hard and elastic CNx thin films by reactive magnetron sputtering [J].

Hellgren, N ;

Johansson, MP ;

Broitman, E ;

Hultman, L ;

Sundgren, JE .

PHYSICAL REVIEW B, 1999, 59 (07) :5162-5169

[8]

HOFSASS H, 1997, MATER RES SOC S P, P438

[9] Nitrogen-driven sp3 to sp2 transformation in carbon nitride materials [J].

Hu, JT ;

Yang, PD ;

Lieber, CM .

PHYSICAL REVIEW B, 1998, 57 (06) :R3185-R3188

[10]

HULTMAN L, 2003, MRS BULL, P194

← 1 2 3 →