Mathematical modeling of electroless nickel deposition at steady state using rotating disk electrode

被引：32

作者：

Kim, YS

Sohn, HJ

机构：

[1] Dept. of Mineral and Petrol. Eng., Seoul National University, Seoul

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1996年 / 143卷 / 02期

关键词：

D O I：

10.1149/1.1836472

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Mathematical modeling of electroless nickel deposition was performed to predict the phosphorus content in Ni-P alloy film at steady state using the rotating disk system. The model consists of steady-state convective diffusion equations with nonlinear boundary conditions and over potential equations satisfying the mixed potential theory. The weight percent of phosphorus predicted in Ni-P alloy agrees well with the experimental values within the experimental conditions carried out.

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页码：505 / 509

页数：5

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