Effect of TiO2 doping on rapid densification of alumina by plasma activated sintering

被引：28

作者：

Mishra, RS

Mukhejee, AK

Yamazaki, K

Shoda, K

机构：

[1] UNIV CALIF DAVIS,DEPT MECH & AERONAUT ENGN,DAVIS,CA 95616

[2] SODICK CO LTD,YOKOHAMA,KANAGAWA,JAPAN

来源：

JOURNAL OF MATERIALS RESEARCH | 1996年 / 11卷 / 05期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1557/JMR.1996.0147

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effects of plasma cycle and TiO2 doping on sintering kinetics during plasma activated sintering (PAS) of gamma-Al2O3 have been studied in the temperature range of 1473-1823 K. Multiple plasma cycle leads to higher densification. Also, TiO2 doping enhances the sintering kinetics during PAS, In TiO2 doped specimens, near full density was obtained at 1673 K in less than 6 min using multiple plasma cycle. It is suggested that the dielectric properties of a material are critical for the success of the PAS process.

引用

页码：1144 / 1148

页数：5

共 19 条

[1] ALPHA-ALUMINA FORMATION IN ALUM-DERIVED GAMMA-ALUMINA [J].