Grazing-incidence small angle x-ray scattering studies of phase separation in hafnium silicate films

被引:87
作者
Stemmer, S [1 ]
Li, YL
Foran, B
Lysaght, PS
Streiffer, SK
Fuoss, P
Seifert, S
机构
[1] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
[2] Int Sematech, Austin, TX 78741 USA
[3] Argonne Natl Lab, Argonne, IL 60439 USA
关键词
D O I
10.1063/1.1617369
中图分类号
O59 [应用物理学];
学科分类号
摘要
Grazing-incidence small-angle x-ray scattering (GISAXS) and high-resolution transmission electron microscopy (HRTEM) were used to investigate phase separation in hafnium silicate films after rapid thermal annealing between 700 and 1000 degreesC. 4-nm-thick Hf-silicate films with 80 and 40 mol % HfO(2), respectively, were prepared by metalorganic vapor deposition. Films of the two compositions showed distinctly different phase-separated microstructures, consistent with two limiting cases of microstructural evolution: nucleation/growth and spinodal decomposition. Films with 40 mol % HfO(2) phase separated in the amorphous by spinodal decomposition and exhibited a characteristic wavelength in the plane of the film. Decomposition with a wavelength of similar to3 nm could be detected at 800 degreesC. At 1000 degreesC the films rapidly demixed with a wavelength of 5 nm. In contrast, films with 80 mol % HfO(2) phase separated by nucleation and growth of crystallites, and showed a more random microstructure. The factors determining specific film morphologies and phase separation kinetics are discussed. (C) 2003 American Institute of Physics.
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页码:3141 / 3143
页数:3
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