Self-lubrication mechanism of chlorine implanted TiN coatings

被引:32
作者
Akhadejdamrong, T
Aizawa, T
Yoshitake, M
Mitsuo, A
Yamamoto, T
Ikuhara, Y
机构
[1] Univ Tokyo, Adv Sci & Technol Res Ctr, Meguro Ku, Tokyo 1538904, Japan
[2] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050003, Japan
[3] Tokyo Metropolitan Ind Technol Res Inst, Tokyo 1158586, Japan
[4] Univ Tokyo, Dept Adv Mat Sci & Engn, Tokyo 1138656, Japan
[5] Univ Tokyo, Engn Res Inst, Tokyo 1138656, Japan
关键词
self-lubrication; ion implantation; chemical modification; chlorine; shear deformation;
D O I
10.1016/S0043-1648(03)00249-7
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
Different from the conventional physical modifications, significant reduction of wear and friction in severe dry conditions can be accommodated to titanium nitride (TiN) coating via the chlorine ion implantation. High friction coefficient with mu = 0.8-1.2 for the as-deposited TiN is reduced to be less than 0.2 at room temperature. Titanium mono-oxide (TiO) and oxides with oxygen deficiency or Magneli phase with TinO2n-1, were formed inside the wear track of Cl-implanted TiN coating. Due to the shear deformability of titanium mono-oxide and crystallographic shearing planes in this Magneli phase, vicinity of the Cl-implanted TiN surface can be elasto-plastically deformed, resulting in reduction of shear stress, wear and friction. Micro-X-ray photoelectron spectroscopy (XPS) measurement as well as high-resolution transparent electron microscopy (HRTEM), were an effective tool to describe local surface reaction taking place inside and outside of the wear track. Oxidation process of TiN during wear is drastically changed at the presence of Cl-atoms on the surface. Cl-atoms diffuse from the inside of TiN to the surface to accelerate the formation of titanium oxides, and to escape out of the system together with oxide debris. Both wear volume and friction coefficient, are preserved to be as low as or lower than diamond like carbon (DLC) coatings. This preferable tribological property comes from self-lubrication mechanism of the Cl-implanted TiN due to significant change of surface reaction by the effect of Cl-atoms. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:668 / 679
页数:12
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