Temperature dependence of the fundamental band gap of InN

被引:377
作者
Wu, J
Walukiewicz, W [1 ]
Shan, W
Yu, KM
Ager, JW
Li, SX
Haller, EE
Lu, H
Schaff, WJ
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Lawrence Berkeley Lab, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
[3] Cornell Univ, Dept Elect & Comp Engn, Ithaca, NY 14853 USA
关键词
D O I
10.1063/1.1605815
中图分类号
O59 [应用物理学];
学科分类号
摘要
The fundamental band gap of InN films grown by molecular beam epitaxy have been measured by transmission and photoluminescence spectroscopy as a function of temperature. The band edge absorption energy and its temperature dependence depend on the doping level. The band gap variation and Varshni parameters of InN are compared with other group III nitrides. The energy of the photoluminescence peak is affected by the emission from localized states and cannot be used to determine the band gap energy. Based on the results obtained on two samples with distinctly different electron concentrations, the effect of degenerate doping on the optical properties of InN is discussed. (C) 2003 American Institute of Physics.
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页码:4457 / 4460
页数:4
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