Smooth and Self-Similar SiO2-like Films on Polymers Synthesized in Roll-to-Roll Atmospheric Pressure-PECVD for Gas Diffusion Barrier Applications

被引：51

作者：

Premkumar, Peter Antony ^{[1
,2
]}

Starostin, Sergey A. ^{[1
,2
]}

Creatore, Mariadriana ^{[1
]}

de Vries, Hindrik ^{[3
]}

Paffen, Roger M. J. ^{[3
]}

Koenraad, Paul M. ^{[4
]}

van de Sanden, Mauritius C. M. ^{[1
]}

机构：

[1] Eindhoven Univ Technol, Dept Appl Phys, Plasma & Mat Proc Grp, NL-5600 MB Eindhoven, Netherlands

[2] M2i, NL-2600 GA Delft, Netherlands

[3] FUJIFILM Mfg Europe BV, Tilburg, Netherlands

[4] Eindhoven Univ Technol, Dept Appl Phys, Photon & Semicond Nanophys Grp, NL-5600 MB Eindhoven, Netherlands

来源：

PLASMA PROCESSES AND POLYMERS | 2010年 / 7卷 / 08期

关键词：

atmospheric pressure glow discharges (APGD); films; gas barriers; morphology; organosilicon precursors; roll-to-roll reactors; surface roughness; PLASMA-JET; DEPOSITION; COATINGS; DISCHARGES; THICKNESS; CVD;

D O I：

10.1002/ppap.200900179

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

SiO2-like layers deposited by means of the developed atmospheric pressure glow-like DBD assisted CVD technology exhibit remarkable film properties, reported for the first time. The films synthesized in a roll-to-roll mode on polymeric webs, are as smooth as the substrate, irrespectively of the precursors (TEOS or HMDSO) and reactive gases (N-2 or air) employed. Detailed AFM investigation on film morphology, surface roughness and auto correlation length (xi) show that they are negligibly influenced with thickness and are similar to that of the polymeric substrate, indicating the self-similar growth of the SiO2-like layers in AP-PECVD. The films are uniform with no defects or particle being incorporated during the deposition process. The produced single layers on polymeric substrate show excellent gas barrier performances towards O-2 and H2O permeation (OTR: <5 x 10(-3) cm(3).m(-2).day(-1) and WVTR: <5 x 10(-3) g.m(-2).day(-1)).

引用

页码：635 / 639

页数：5

共 36 条

[1]

ALDEA E, Patent No. 2007210721

[2]

ALEXANDROV SE, 2005, CHEM VAPOR DEPOS, V11, P2005

[3]

ARESTA G, 2010, PLASMA PROCESS POLYM

[4] Thin film deposition by means of atmospheric pressure microplasma jet [J].

Benedikt, J. ;

Raballand, V. ;

Yanguas-Gil, A. ;

Focke, K. ;

von Keudell, A. .

PLASMA PHYSICS AND CONTROLLED FUSION, 2007, 49 (12B) :B419-B427

[5] Gas diffusion ultrabarriers on polymer substrates using Al2O3 atomic layer deposition and SiN plasma-enhanced chemical vapor deposition [J].

Carcia, P. F. ;

McLean, R. S. ;

Groner, M. D. ;

Dameron, A. A. ;

George, S. M. .

JOURNAL OF APPLIED PHYSICS, 2009, 106 (02)

[6] Diffuse Coplanar Surface Barrier Discharge and its applications for in-line processing of low-added-value materials [J].

Cernak, M. ;

Cernakova, L. ;

Hudec, I. ;

Kovacik, D. ;

Zahoranova, A. .

EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2009, 47 (02)

[7] Atmospheric pressure plasma of dielectric barrier discharges [J].

Chirokov, A ;

Gutsol, A ;

Fridman, A .

PURE AND APPLIED CHEMISTRY, 2005, 77 (02) :487-495

[8]

DEVRIES H, 2006, Patent No. 1626613

[9] Mechanism of water vapor transport through PET/AlOxNy gas barrier films [J].

Erlat, AG ;

Henry, BM ;

Grovenor, CRM ;

Briggs, GAD ;

Chater, RJ ;

Tsukahara, Y .

JOURNAL OF PHYSICAL CHEMISTRY B, 2004, 108 (03) :883-890

[10] Morphology and gas barrier properties of thin SiOx coatings on polycarbonate:: Correlations with plasma-enhanced chemical vapor deposition conditions [J].

Erlat, AG ;

Wang, BC ;

Spontak, RJ ;

Tropsha, Y ;

Mar, KD ;

Montgomery, DB ;

Vogler, EA .

JOURNAL OF MATERIALS RESEARCH, 2000, 15 (03) :704-717

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