Transient x-ray diffraction used to diagnose shock compressed Si crystals on the Nova laser

被引：25

作者：

Kalantar, DH ^{[1
]}

Chandler, EA

Colvin, JD

Lee, R

Remington, BA

Weber, SV

Hauer, A

Wark, JS

Loveridge, A

Failor, BH

Meyers, MA

Ravichandran, G

Wiley, LG

机构：

[1] Univ Calif Lawrence Livermore Natl Lab, Livermore, CA 94550 USA

[2] Univ Calif Los Alamos Natl Lab, Los Alamos, NM 87545 USA

[3] Univ Oxford, Dept Phys, Clarendon Lab, Oxford OX1 3PU, England

[4] Phys Int Co, San Leandro, CA 94577 USA

[5] Univ Calif San Diego, La Jolla, CA 92093 USA

[6] CALTECH, Pasadena, CA 91125 USA

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1999年 / 70卷 / 01期

关键词：

D O I：

10.1063/1.1149384

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Transient x-ray diffraction is used to record time-resolved information about the shock compression of materials. This technique has been applied on Nova shock experiments driven using a hohlraum x-ray drive. Data were recorded from the shock release at the free surface of a Si crystal, as well as from Si at an embedded ablator/Si interface. Modeling has been done to simulate the diffraction data incorporating the strained crystal rocking curves and Bragg diffraction efficiencies. Examples of the data and post-processed simulations are presented. (C) 1999 American Institute of Physics. [S0034-6748(99)62601-6].

引用

页码：629 / 632

页数：4

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