Effect of surface roughness on field emission from chemical vapor deposited polycrystalline diamond

被引:24
作者
Koenigsfeld, N [1 ]
Kalish, R
Cimmino, A
Hoxley, D
Prawer, S
Yamada, I
机构
[1] Technion Israel Inst Technol, Dept Phys, IL-32000 Haifa, Israel
[2] Technion Israel Inst Technol, Inst Solid State, IL-32000 Haifa, Israel
[3] Univ Melbourne, Sch Phys, Parkville, Vic 3052, Australia
[4] Kyoto Univ, Ion Beam Engn Lab, Sakyo Ku, Kyoto 6068501, Japan
关键词
D O I
10.1063/1.1383803
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effect of surface roughness on electron emission from hydrogenated polycrystalline diamond films is reported. Field emission measurements were performed with both millimeter and nanometer spatial resolution using scanning probe techniques. Surface asperities were removed by ion beam treatment, which resulted in a reduction of the rms roughness from 198 to 94 nm, leading to an increase in the threshold field required for electron emission by about a factor of 2. These results suggest that surface asperities, rather than grain boundaries, are the dominant influence on electron emission in polycrystalline diamond films. (C) 2001 American Institute of Physics.
引用
收藏
页码:1288 / 1290
页数:3
相关论文
共 6 条
  • [1] Field emission from boron-doped polycrystalline diamond film at the nanometer level within grains
    Andrienko, I
    Cimmino, A
    Hoxley, D
    Prawer, S
    Kalish, R
    [J]. APPLIED PHYSICS LETTERS, 2000, 77 (08) : 1221 - 1223
  • [2] Geis M. W., 1995, Lincoln Laboratory Journal, V8, P161
  • [3] ELECTRON FIELD-EMISSION FROM DIAMOND AND OTHER CARBON MATERIALS AFTER H-2, O-2 AND CS TREATMENT
    GEIS, MW
    TWICHELL, JC
    MACAULAY, J
    OKANO, K
    [J]. APPLIED PHYSICS LETTERS, 1995, 67 (09) : 1328 - 1330
  • [4] QUANTUM PHOTOYIELD OF DIAMOND(111) - STABLE NEGATIVE-AFFINITY EMITTER
    HIMPSEL, FJ
    KNAPP, JA
    VANVECHTEN, JA
    EASTMAN, DE
    [J]. PHYSICAL REVIEW B, 1979, 20 (02): : 624 - 627
  • [5] KABARUTOV AV, 1999, DIAM RELAT MATER, V8, P763
  • [6] Electrochemical behavior of boron-doped diamond electrodes
    Vinokur, N
    Miller, B
    Avyigal, Y
    Kalish, R
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (10) : L238 - L240