Monitoring PMMA Elimination by Reactive Ion Etching from a Lamellar PS-b-PMMA Thin Film by ex Situ TEM Methods

被引：65

作者：

Farrell, Richard A. ^{[1
,2
,3
]}

Petkov, Nikolay ^{[3
,4
]}

Shaw, Matthew T. ^{[2
,5
]}

Djara, Vladimir ^{[3
]}

Holmes, Justin D. ^{[1
,2
,3
]}

Morris, Michael A. ^{[1
,2
,3
]}

机构：

[1] Univ Coll Cork, Dept Chem, Mat & Supercrit Fluid Grp, Cork, Ireland

[2] Trinity Coll Dublin, CRANN, Dublin 2, Ireland

[3] Tyndall Natl Inst, Micronano Elect Ctr, Cork, Ireland

[4] Tyndall Natl Inst, EMAF, Cork, Ireland

[5] Intel Ireland Ltd, Leixlip, Kildare, Ireland

来源：

MACROMOLECULES | 2010年 / 43卷 / 20期

基金：

爱尔兰科学基金会;

关键词：

BLOCK-COPOLYMERS; NANOLITHOGRAPHY; METHACRYLATE); LITHOGRAPHY; ORIENTATION; FABRICATION; TEMPLATES; BEHAVIOR; DOMAINS;

D O I：

10.1021/ma101827u

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Block copolymer thin films require selective elimination of one of their constituent blocks to access their potential as lithographic nanopatterns. This paper demonstrates an on-substrate TEM-based approach for establishing the removal of poly(methyl methyacrylate) from vertically oriented lamellar polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) thin films and subsequent transfer to the underlying silicon by reactive ion etching. The ex situ microscopy technique presents an insight into the removal of PMMA, the etch end point, PS Electing, etch anisotropy, and residual PS thickness.

引用

页码：8651 / 8655

页数：5

共 30 条

[1] Nanopatterning with microdomains of block copolymers using reactive-ion etching selectivity [J].

Asakawa, K ;

Hiraoka, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (10) :6112-6118

[2] Graphoepitaxy of self-assembled block copolymers on two-dimensional periodic patterned templates [J].

Bita, Ion ;

Yang, Joel K. W. ;

Jung, Yeon Sik ;

Ross, Caroline A. ;

Thomas, Edwin L. ;

Berggren, Karl K. .

SCIENCE, 2008, 321 (5891) :939-943

[3] Rapid directed self assembly of lamellar microdomains from a block copolymer containing hybrid [J].

Cheng, Joy Y. ;

Pitera, Jed ;

Park, Oun-Ho ;

Flickner, Myron ;

Ruiz, Ricardo ;

Black, Charles T. ;

Kim, Ho-Cheol .

APPLIED PHYSICS LETTERS, 2007, 91 (14)

[4] Nanostructure engineering by templated self-assembly of block copolymers [J].

Cheng, JY ;

Mayes, AM ;

Ross, CA .

NATURE MATERIALS, 2004, 3 (11) :823-828

[5] Directing the self-assembly of block copolymers [J].

Darling, S. B. .

PROGRESS IN POLYMER SCIENCE, 2007, 32 (10) :1152-1204

[6] Study on the Combined Effects of Solvent Evaporation and Polymer Flow upon Block Copolymer Self-Assembly and Alignment on Topographic Patterns [J].

Fitzgerald, Thomas G. ;

Farrell, Richard A. ;

Petkov, Nikolay ;

Bolger, Ciara T. ;

Shaw, Matthew T. ;

Charpin, Jean P. F. ;

Gleeson, James P. ;

Holmes, Justin D. ;

Morris, Michael A. .

LANGMUIR, 2009, 25 (23) :13551-13560

[7] Perpendicular Orientation of Domains in Cylinder-Forming Block Copolymer Thick Films by Controlled Interfacial Interactions [J].

Han, Eungnak ;

Stuen, Karl O. ;

Leolukman, Melvina ;

Liu, Chi-Chun ;

Nealey, Paul F. ;

Gopalan, Padma .

MACROMOLECULES, 2009, 42 (13) :4896-4901

[8] Pushing the limits of lithography [J].

Ito, T ;

Okazaki, S .

NATURE, 2000, 406 (6799) :1027-1031

[9] Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer [J].

Jung, Yeon Sik ;

Ross, C. A. .

NANO LETTERS, 2007, 7 (07) :2046-2050

[10] Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates [J].

Kim, SO ;

Solak, HH ;

Stoykovich, MP ;

Ferrier, NJ ;

de Pablo, JJ ;

Nealey, PF .

NATURE, 2003, 424 (6947) :411-414

← 1 2 3 →