Pivoting micromirror designs for large orientation angles

This paper describes mechanical design concepts for a class of pivoting micromirrors that permit relatively large angles of orientation to be obtained when configured in large arrays. Micromirror arrays can be utilized in a variety of applications ranging from optical switching to beam-front correction in a variety of technologies [1, 2]. This particular work is concerned with silicon surface micromachining (SMM). The multi-layer polysilicon surface micromachining process developed at Sandia National Laboratories is used to fabricate micromirror arrays that consist of capacitive electrode pairs which are used to electrostatically actuate mirrors to their desired positions and suitable elastic suspensions which support the 2 mum thick mirror structures. The designs described have been fabricated and successfully operated. Figure 1 illustrates a 100-mum x 100-mum micromirror actuated to 10 degrees.