Mesoscopic and submicroscopic patterning in thin polymer films: Impact of the solvent

被引：51

作者：

Bormashenko, E ^{[1
]}

Pogreb, R

Stanevsky, O

Bormashenko, Y

Tamir, S

Cohen, R

Nunberg, M

Gaisin, VZ

Gorelik, M

Gendelman, OV

机构：

[1] Coll Judea & Samaria, Lab Polymer Mat, IL-44837 Ariel, Israel

[2] Technion Israel Inst Technol, Fac Mech Engn, IL-32000 Haifa, Israel

来源：

MATERIALS LETTERS | 2005年 / 59卷 / 19-20期

关键词：

polymers; microstructure; self-assembling; solvent; mesoscopic; pores;

D O I：

10.1016/j.matlet.2005.03.015

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Formation of mesoscopic and submicrometric self-assembled patterns in polystyrene and polycarbonate films produced by a fast dipcoating process was studied. Mixtures of chloroform and dichloromethane were used as a solvent. The mixture's composition plays a decisive role in the patterning. Close-packed honeycomb structures comprised of 200-2000 nm pores dispersed in polymer matrix were obtained. The mechanism of self-assembling is discussed. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：2461 / 2464

页数：4

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