Correlation between morphology and cathodoluminescence in porous GaP

被引:47
作者
Stevens-Kalceff, MA [1 ]
Tiginyanu, IM
Langa, S
Föll, H
Hartnagel, HL
机构
[1] Univ Technol Sydney, Dept Appl Phys, Sydney, NSW 2007, Australia
[2] Tech Univ Moldova, Inst Appl Phys, Lab Low Dimens Semicond Struct, MD-2004 Chisinau, Moldova
[3] Univ Kiel, Fac Engn, Dept Mat Sci, D-24143 Kiel, Germany
[4] Tech Univ Darmstadt, D-64283 Darmstadt, Germany
关键词
D O I
10.1063/1.1337922
中图分类号
O59 [应用物理学];
学科分类号
摘要
Porous layers fabricated by anodic etching of n-GaP substrates in a sulfuric acid solution were studied by electron microscopy and cathodoluminescence (CL) microanalysis. The morphology of porous layers was found to depend strongly upon the anodization conditions. When the etching process starts at the initial surface, "catacomb-like" pores and current-line oriented pores are introduced at low and high anodic current densities, respectively. After the initial development of either kind of pore, further anodization at the current density of about 1 mA/cm(2) favors the propagation of pores along [111] crystallographic directions. The spatial and spectral distribution of CL in bulk and porous samples is presented. A comparative analysis of the secondary electron and panchromatic CL images evidenced a porosity induced increase in the emission efficiency. (C) 2001 American Institute of Physics.
引用
收藏
页码:2560 / 2565
页数:6
相关论文
共 29 条
[1]   TIME-RESOLVED BLUE AND ULTRAVIOLET PHOTOLUMINESCENCE IN POROUS GAP [J].
ANEDDA, A ;
SERPI, A ;
KARAVANSKII, VA ;
TIGINYANU, IM ;
ICHIZLI, VM .
APPLIED PHYSICS LETTERS, 1995, 67 (22) :3316-3318
[2]  
Awadelkarim O. O., 1989, Materials Science Forum, V38-41, P821, DOI 10.4028/www.scientific.net/MSF.38-41.821
[3]   NEUTRON DAMAGE IN GAP-ZN,O LIGHT-EMITTING-DIODES [J].
BARNES, CE .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (05) :1921-1927
[4]  
BELOGOROKHOV AI, 1994, JETP LETT+, V60, P274
[5]   The structural and luminescence properties of porous silicon [J].
Cullis, AG ;
Canham, LT ;
Calcott, PDJ .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (03) :909-965
[6]  
DAPKUS PD, 1976, J APPL PHYS, V47, P4061, DOI 10.1063/1.323236
[7]   INTERIMPURITY RECOMBINATIONS INVOLVING ISOELECTRONIC TRAP BISMUTH IN GALLIUM PHOSPHIDE [J].
DEAN, PJ ;
CUTHBERT, JD ;
LYNCH, RT .
PHYSICAL REVIEW, 1969, 179 (03) :754-&
[8]   OPTICAL PROPERTIES OF GROUP 4 ELEMENTS CARBON AND SILICON IN GALLIUM PHOSPHIDE [J].
DEAN, PJ ;
FROSCH, CJ ;
HENRY, CH .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (12) :5631-&
[9]   Morphology and strongly enhanced photoresponse of GaP electrodes made porous by anodic etching [J].
Erne, BH ;
Vanmaekelbergh, D ;
Kelly, JJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (01) :305-314
[10]   Progress toward nanoscale silicon light emitters [J].
Fauchet, PM .
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 1998, 4 (06) :1020-1028