Computational band-structure engineering of III-V semiconductor alloys

被引:96
作者
Geller, CB [1 ]
Wolf, W
Picozzi, S
Continenza, A
Asahi, R
Mannstadt, W
Freeman, AJ
Wimmer, E
机构
[1] Bettis Atom Power Lab, W Mifflin, PA 15122 USA
[2] Mat Design, Oceanside, CA 92057 USA
[3] Mat Design, Le Mans, France
[4] Northwestern Univ, Dept Phys & Astron, Evanston, IL 60201 USA
[5] Northwestern Univ, Mat Res Ctr, Evanston, IL 60201 USA
[6] ISMANS, Le Mans, France
关键词
D O I
10.1063/1.1383282
中图分类号
O59 [应用物理学];
学科分类号
摘要
Accurate band structures of binary semiconductors AB (A=Al, Ga, In and B=P, As, Sb) and selected ternary III-V semiconductors were calculated using an all-electron screened exchange approach within the full potential linearized augmented plane-wave method. Fundamental band gaps and Gamma -L and Gamma -X separations in higher-lying conduction bands are predicted with an accuracy of a few tenths of 1 eV. Screened exchange also performs better than the local density approximation for calculating conduction-band effective masses. Highly n-doped InPAs materials with compositions near InP0.2As0.8 offer lower effective masses, greater optical band-gap shifts, and potentially higher electron mobility than n-doped InGaAs materials with comparable band gaps. (C) 2001 American Institute of Physics.
引用
收藏
页码:368 / 370
页数:3
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