The future of lithography: SEMATECH Litho Forum 2008

被引：45

作者：

Willson, C. Grant ^{[1
]}

Roman, Bernard J. ^{[2
]}

机构：

[1] Univ Texas Austin, Dept Chem Engn, Austin, TX 78712 USA

[2] SEMATECH, Austin, TX 78741 USA

来源：

ACS NANO | 2008年 / 2卷 / 07期

关键词：

D O I：

10.1021/nn800410c

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The biannual SEMATECH Litho Forum was held May 12-14,2008 in Bolton Landing, NY, not far from SEMATECH's facility at Albany Nanotech. This biannual meeting is designed to assess the progress in advanced patterning technology and to produce consensus about the processes that will be used to manufacture the next generations of devices. A summary of the key ideas presented at the meeting is given in this paper, along with the future challenges and opportunities in emerging lithographic technologies.

引用

页码：1323 / 1328

页数：6

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