Spatial uniformity of laser-accelerated ultrahigh-current MeV electron propagation in metals and insulators

被引:170
作者
Fuchs, J [1 ]
Cowan, TE
Audebert, P
Ruhl, H
Gremillet, L
Kemp, A
Allen, M
Blazevic, A
Gauthier, JC
Geissel, M
Hegelich, M
Karsch, S
Parks, P
Roth, M
Sentoku, Y
Stephens, R
Campbell, EM
机构
[1] Gen Atom Co, San Diego, CA 92121 USA
[2] Univ Paris 06, Ecole Polytech, CEA, CNRS,UMR 7605,Lab Utilisat Lasers Intenses, F-91128 Palaiseau, France
[3] Univ Nevada, Dept Phys, Reno, NV 89557 USA
[4] CEA, DPTA, Bruyeres Le Chatel, France
[5] Gesell Schwerionenforsch mbH, D-6100 Darmstadt, Germany
[6] Max Planck Inst Quantum Opt, Garching, Germany
关键词
D O I
10.1103/PhysRevLett.91.255002
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The evolution of laser-generated MeV, MA electron beams propagating through conductors and insulators has been studied by comparing measurement and modeling of the distribution of MeV protons that are sheath accelerated by the propagated electrons. We find that electron flow through metals is uniform and can be laser imprinted, whereas propagation through insulators induces spatial disruption of the fast electrons. Agreement is found with material dependent modeling.
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页数:4
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