Growth and properties of scandium epitaxial films on GaN

被引:18
作者
Kaplan, R
Prokes, SM
Binari, SC
Kelner, G
机构
[1] Naval Research Laboratory, Washington
关键词
D O I
10.1063/1.116563
中图分类号
O59 [应用物理学];
学科分类号
摘要
Epitaxial scandium films have been grown on c-axis-oriented wurtzite GaN. The films are highly ordered, adherent, and reflective. For substrate temperatures in the range 640-780 degrees C an interfacial reaction yields a ScN layer whose thickness increases with temperature, consistent with Sc diffusion as the rate limiting step. Electrical contacts fabricated from the Sc/ScN/GaN films exhibit a 1.0 eV barrier height on n-type GaN, The Sc films, which represent a class of ductile materials, may constitute a compliant substrate for overgrowth of GaN.
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页码:3248 / 3250
页数:3
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