Molecular simulation of gas adsorption in realistic models of silica nanopores

被引:7
作者
Coasne, B
Hung, FR
Siperstein, FR
Gubbins, KE
机构
[1] Univ Montpellier 2, Lab Physicochim Mat Condensee, UMR 5617, CNRS, F-34095 Montpellier, France
[2] N Carolina State Univ, Dept Chem & Biomol Engn, Raleigh, NC 27695 USA
[3] Univ Rovira & Virgili, Dept Engn Quim, Tarragona 43007, Spain
来源
ANNALES DE CHIMIE-SCIENCE DES MATERIAUX | 2005年 / 30卷 / 04期
关键词
D O I
10.3166/acsm.30.375-383
中图分类号
O6 [化学];
学科分类号
0703 [化学];
摘要
This paper presents a molecular simulation study of Xe adsorption at 195 K in two atomistic models of silica MCM-41 pores. Model A consists of a regular cylindrical pore having a constant section. Model B has an important surface disorder that reproduces the morphological features of an on-lattice simulation mimicking the synthesis process of MCM-41 pores. The adsorption isotherm for model A exhibits a large hysteresis loop that is typical of capillary condensation in regular nanopores. In contrast, the adsorption/desorption process for model B is a quasi-continuous and quasi-reversible mechanism. Due to the important surface roughness for model B, the isosteric heat of adsorption for this sample is much larger than that for the regular cylindrical pore. Where possible, comparison with experimental data is made.
引用
收藏
页码:375 / 383
页数:9
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