Room temperature Coulomb oscillation & memory effect for single electron memory made by pulse-mode AFM nano-oxidation process

被引:9
作者
Matsumoto, K [1 ]
Gotoh, Y [1 ]
Maeda, T [1 ]
Dagata, JA [1 ]
Harris, JS [1 ]
机构
[1] MITI, Electrotech Lab, Tsukuba, Ibaraki 305, Japan
来源
INTERNATIONAL ELECTRON DEVICES MEETING 1998 - TECHNICAL DIGEST | 1998年
关键词
D O I
10.1109/IEDM.1998.746395
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A single electron transistor(SET) and a single electron memory were fabricated using the improved pulse-mode AFM nano-oxidation process. A single electron transistor which works as an electrometer for detecting the potential of the memory node of the single electron memory showed the clear Coulomb oscillation characteristics with the periods of 2.1V at room temperature. A single electron memory showed the hysteresis loop by the return trip of the memory bias when starting from 0V to 10V and again coming back to 0V.
引用
收藏
页码:449 / 452
页数:4
相关论文
共 5 条
[1]   Understanding scanned probe oxidation of silicon [J].
Dagata, JA ;
Inoue, T ;
Itoh, J ;
Yokoyama, H .
APPLIED PHYSICS LETTERS, 1998, 73 (02) :271-273
[2]   Fabrication of single electron memory on atomically flat α-Al2O3 substrate made by AFM nano-oxidation process [J].
Matsumoto, K ;
Gotoh, Y ;
Shirakashi, J ;
Maeda, T ;
Harris, JS .
INTERNATIONAL ELECTRON DEVICES MEETING - 1997, TECHNICAL DIGEST, 1997, :155-158
[3]   Room temperature operation of a single electron transistor made by the scanning tunneling microscope nanooxidation process for the TiOx/Ti system [J].
Matsumoto, K ;
Ishii, M ;
Segawa, K ;
Oka, Y ;
Vartanian, BJ ;
Harris, JS .
APPLIED PHYSICS LETTERS, 1996, 68 (01) :34-36
[4]   Application of STM Nanometer-Size Oxidation Process to Planar-Type MIM Diode [J].
MATSUMOTO, K ;
TAKAHASHI, S ;
ISHII, M ;
HOSHI, M ;
KUROKAWA, A ;
ICHIMURA, S ;
ANDO, A .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1995, 34 (2B) :1387-1390
[5]  
Matsumoto K, 1995, INTERNATIONAL ELECTRON DEVICES MEETING, 1995 - IEDM TECHNICAL DIGEST, P363, DOI 10.1109/IEDM.1995.499215