Heterointerface effects on the charging energy of the shallow D- ground state in silicon: Role of dielectric mismatch

被引:24
作者
Calderon, M. J. [1 ]
Verduijn, J. [2 ]
Lansbergen, G. P. [2 ]
Tettamanzi, G. C. [2 ]
Rogge, S. [2 ]
Koiller, Belita [3 ]
机构
[1] CSIC, Inst Ciencia Mat Madrid, E-28049 Madrid, Spain
[2] Delft Univ Technol, Kavli Inst Nanosci, NL-2628 CJ Delft, Netherlands
[3] Univ Fed Rio de Janeiro, Inst Fis, BR-21941972 Rio De Janeiro, Brazil
来源
PHYSICAL REVIEW B | 2010年 / 82卷 / 07期
关键词
SI; TRANSISTORS; GERMANIUM; ACCEPTORS; SYSTEMS; DONORS; FIELD; ATOM;
D O I
10.1103/PhysRevB.82.075317
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Donor states in Si nanodevices can be strongly modified by nearby insulating barriers and metallic gates. Experimental results indicate a strong reduction in the charging energy of isolated As dopants in Si nonplanar field effect transistors relative to the bulk value. By studying the problem of two electrons bound to a shallow donor within the effective mass approach, we find that the measured reduction in the charging energy (measurements also presented here) may be due to a combined effect of the insulator screening and the proximity of metallic gates.
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页数:7
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