The infrared optical functions of AlxGa1-xN determined by reflectance spectroscopy

被引:48
作者
Yu, G
Ishikawa, H
Umeno, M
Egawa, T
Watanabe, J
Soga, T
Jimbo, T
机构
[1] Nagoya Inst Technol, Res Ctr Micro Struct Devices, Showa Ku, Nagoya, Aichi 466, Japan
[2] Nagoya Inst Technol, Dept Elect & Comp Engn, Showa Ku, Nagoya, Aichi 466, Japan
关键词
D O I
10.1063/1.122177
中图分类号
O59 [应用物理学];
学科分类号
摘要
Infrared reflectivity measurements have been carried out on samples with structures of GaN/sapphire and AlxGa1-x/N/GaN/sapphire as well as sapphire substrates. Analyses of the reflectance data of sapphire using the Kramers-Kronig technique and fitting of the reflectance spectra of GaN and AlxGa1-xN samples using analytical expressions have been made. The high-frequency dielectric constant epsilon(alpha) and the transverse phonon frequency omega(TO), are found to vary from 5.15 to 4.2 and from 559.7 to 586.3 cm(-1), respectively, when the composition x is varied from 0 to 0.35 at room temperature. The E2 mode, which arises from the disordered stale of the alloys, has been observed in the reflectivity spectrum of AlxGa1-xN, and the intensity of the peak is enhanced by increasing the Al content. (C) 1998 American Institute of Physics.
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页码:1472 / 1474
页数:3
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