We report the fabrication and evaluation of a Pbl(2) imager using large area amorphous silicon technology. This approach uses a thick Pbl(2) x-ray photoconductor to absorb x-rays and collect ionization charge under the action of an applied field, while amorphous silicon thin film transistors (TFT) provide a matrix-addressed read out of the signal to external electronics. The x-ray sensitivity of Pbl(2) is high, and mobility-lifetime product is large enough to yield a high charge collection at low applied fields. The test arrays used to evaluate Pbl(2) have 256x256 pixels of size 200 microns. Each pixel contains an amorphous silicon switching transistor, gate and data addressing lines, a charge storage capacitor and a metal pad to contact the Pbl(2) layer. Early evaluation of the image sensor indicates the promise of Pbl(2), but indicates that reduction of the leakage current is important.