Optimized nickel-oxide-based electrochromic thin films

被引：38

作者：

Avendaño, E ^{[1
]}

Azens, A ^{[1
]}

Isidorsson, J ^{[1
]}

Karmhag, R ^{[1
]}

Niklasson, GA ^{[1
]}

Granqvist, CG ^{[1
]}

机构：

[1] Uppsala Univ, Dept Engn Sci, Angstrom Lab, SE-75121 Uppsala, Sweden

来源：

SOLID STATE IONICS | 2003年 / 165卷 / 1-4期

关键词：

electrochromism; nickel-based oxides; sputtering conditions; transmittance; thin films;

D O I：

10.1016/j.ssi.2003.08.029

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Reactive DC magnetron sputtering was used to make oxide films based on Ni, NiV0.08, NiAl0.56, NiMg0.8, and NiV0.08Mg0.5. All of these films were capable of showing electrochromism in KOH. The addition of Al or Mg increased the luminous transmittance significantly, while the charge capacity was maintained. Al- and Mg-containing films are superior to the conventional Ni oxide electrodes for applications requiring high bleached-state transmittance, such as architectural "smart windows". (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：169 / 173

页数：5

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