Three dimensional simulation of the morphological evolution of a strained film on a thick substrate

被引：2

作者：

Chiu, CH ^{[1
]}

机构：

[1] Natl Univ Singapore, Inst Mat Res & Engn, Singapore 119260, Singapore

来源：

COMPUTATIONAL AND MATHEMATICAL MODELS OF MICROSTRUCTURAL EVOLUTION | 1998年 / 529卷

关键词：

D O I：

10.1557/PROC-529-125

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This paper presents a three-dimensional simulation for the surface evolution of a strained film on a thick substrate. The simulation shows that an initially random morphology will first transform into a profile dominated by two-dimensional ridges, and then into a three-dimensional island surface. The simulation also demonstrates that the ridge-island transition is a kinetic process which can be delayed by changing the initial morphology.

引用

页码：125 / 130

页数：6