Kelvin probe force microscopy and its application

被引：1308

作者：

Melitz, Wilhelm ^{[1
,2
]}

Shen, Jian ^{[1
,2
]}

Kummel, Andrew C. ^{[1
]}

Lee, Sangyeob ^{[1
]}

机构：

[1] Univ Calif San Diego, Dept Chem & Biochem, La Jolla, CA 92093 USA

[2] Univ Calif San Diego, Mat Sci & Engn Program, La Jolla, CA 92093 USA

来源：

SURFACE SCIENCE REPORTS | 2011年 / 66卷 / 01期

关键词：

Kelvin probe force microscopy; Scanning probe miscroscopy; FREQUENCY-MODULATION-DETECTION; POTENTIAL PROFILE MEASUREMENT; LOCAL WORK FUNCTION; CATALYTIC-ACTIVITY; ATOMIC-RESOLUTION; DIFFUSION LENGTH; SURFACE-CHARGE; QUANTUM DOTS; OXIDATION; CLUSTERS;

D O I：

10.1016/j.surfrep.2010.10.001

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Kelvin probe force microscopy (KPFM) is a tool that enables nanometer-scale imaging of the surface potential on a broad range of materials. KPFM measurements require an understanding of both the details of the instruments and the physics of the measurements to obtain optimal results. The first part of this review will introduce the principles of KPFM and compare KPFM to other surface work function and potential measurement tools, including the Kelvin probe (KP), photoemission spectroscopy (PES), and scanning electron microscopy (SEM) with an electron beam induced current (EBIC) measurement system. The concept of local contact potential difference (LCPD), important for understanding atomic resolution KPFM, is discussed. The second part of this review explores three applications of KPFM: metallic nanostructures, semiconductor materials, and electrical devices. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：1 / 27

页数：27

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