Ultrafast, dual-depletion region, InGaAs/InP p-i-n detector

被引:88
作者
Effenberger, FJ [1 ]
Joshi, AM [1 ]
机构
[1] DISCOVERY SEMICONDUCT INC,CRANBURY,NJ 08512
关键词
D O I
10.1109/50.532024
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The design of a new kind of photodetector, the dual-depletion region p-i-n photodetector, is presented. This vertical detector has a parasitic capacitance and transit time that can be controlled semi-independently. This eases the classical tradeoff between these two speed limiting factors, allowing the design of large, fast detectors. A theoretical analysis of the transit time effect and the capacitance effect is made. This analysis is then used to compute optimum design parameters.
引用
收藏
页码:1859 / 1864
页数:6
相关论文
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