Low electric field induced (001) oriented growth of LiNbO3 films by pulsed laser ablation

被引：34

作者：

Hu, WS ^{[1
]}

Liu, ZG ^{[1
]}

Feng, D ^{[1
]}

机构：

[1] NANJING UNIV,INST SOLID STATE PHYS,NANJING 210093,PEOPLES R CHINA

来源：

SOLID STATE COMMUNICATIONS | 1996年 / 97卷 / 06期

关键词：

ferroelectrics; thin films; laser processing; optical properties; X-ray and gamma-ray spectroscopies;

D O I：

10.1016/0038-1098(95)00707-5

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

It has been demonstrated that a low electric field of a very few V/cm can induce textured growth of LiNbO3 thin films fabricated by the pulsed laser ablation technique. By applying an electric field of 7 V/cm perpendicular to the substrate, completely (001) oriented LiNbO3 films have been grown on fused silica by this method. The films are stoichiometric and very smooth. Optical transmittance measurements showed that the films are of high transparency and have a refractive index close to that of bulk crystals. The effects of electric field in the growth of ferroelectric films were analysed in terms of Volmer-Weber nucleation theory taking into consideration the electrostatic energy. This method should open a new way to produce LiNbO3 multilayers composed of periodic domain layers with alternatively reversed poling direction.

引用

页码：481 / 485

页数：5

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