Impact of oxygen on the work functions of Mo in vacuum and on ZrO2 -: art. no. 064911

被引:28
作者
Knizhnik, AA
Iskandarova, IM
Bagatur'yants, AA
Potapkin, BV
Fonseca, LRC
机构
[1] Kinet Technol Ltd, Moscow 123182, Russia
[2] Freescale Semicond Brasil Ltd, BR-13820000 Jaguariuna, Brazil
关键词
D O I
10.1063/1.1861972
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electronic properties of molybdenum surfaces and interfaces with monoclinic zirconia (Mo/m-ZrO2) of different stoichiometries are investigated through first-principles calculations. We show that oxygen adsorption on the Mo(110) surface strongly increases the Mo vacuum work function, and that a similar trend is observed for the Mo(110) work function on zirconia upon oxygenation of the stoichiometric Mo/m-ZrO2 interface, albeit to a smaller extent. As expected, Mo/m-ZrO2 interface reduction/oxidation decreases/increases the Mo effective work function. However, interface overoxidation leading to the formation of a thin MoOx layer between Mo and m-ZrO2 (Mo/MoOx/m-ZrO2) causes a work-function decrease with respect to the stoichiometric Mo/m-ZrO2 interface value. This result is especially surprising because calculations indicate that subsurface oxidation of Mo slabs increases the Mo vacuum work function. Moreover, the calculated vacuum work function of rutile MoO2(110) slab is similar to 6.0 eV, considerably larger than that of Mo(110) (similar to 4.9 eV). The physical origin of this effect is explained in terms of a partial cancellation interface dipoles. (C) 2005 American Institute of Physics.
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页数:6
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