Turning electrospun poly(methyl methacrylate) nanofibers into graphitic nanostructures by in situ electron beam irradiation

Using ultrathin electrospun poly(methyl methacrylate) (PMMA) nanofibers as precursor, graphitic nanofibers, nanobridges, nanocones, and fullerenelike onions could be prepared by electron beam irradiation in a controlled manner. With the help of the high resolution transmission electron microscopy, the real time processing of the carbonization and graphitization of the PMMA nanofibers could be investigated. This way to obtain graphitic nanostructures has promising applications in graphitic carbon nanostructure electronics and devices. Because PMMA is a widely used standard high resolution electron resist, this graphitization could be combined with electron beam lithography to obtain high resolution patterned graphitic circuits. (c) 2008 American Institute of Physics.