Preparation and Evaluation of Graphite Oxide Reduced at 220 °C

被引：197

作者：

Zangmeister, Christopher D. ^{[1
]}

机构：

[1] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA

来源：

CHEMISTRY OF MATERIALS | 2010年 / 22卷 / 19期

关键词：

GRAPHENE OXIDE; REDUCTION; FILMS; TRANSPARENT; ENVIRONMENT; SERIES;

D O I：

10.1021/cm102005m

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The reduction of graphite oxide (GO) thin films was evaluated at 220 degrees C using a combination of infrared (FTIR) and X-ray photoemission spectroscopies (XPS). The results were correlated with electrical resistance measurements. The chemical composition of GO was C-8(OH)(3)O-0.8 and reduced to C-8(OH)(0.5)O-0.3 after nearly 24 h of low-temperature processing, defined as 220 degrees C. The sheet resistance of dropcast GO thin films processed at 220 degrees C in air was 8 k Omega sq(-1), similar to GO reduced at >800 degrees C in an inert atmosphere.

引用

页码：5625 / 5629

页数：5

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