Tunable band gaps in bilayer transition-metal dichalcogenides

被引:569
作者
Ramasubramaniam, Ashwin [1 ]
Naveh, Doron [2 ]
Towe, Elias [2 ]
机构
[1] Univ Massachusetts, Dept Mech & Ind Engn, Amherst, MA 01003 USA
[2] Carnegie Mellon Univ, Dept Elect & Comp Engn, Pittsburgh, PA 15213 USA
基金
美国国家科学基金会;
关键词
ELECTRONIC-STRUCTURE; MOS2;
D O I
10.1103/PhysRevB.84.205325
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigate band-gap tuning in bilayer transition-metal dichalcogenides by external electric fields applied perpendicular to the layers. Using density functional theory, we show that the fundamental band gap of MoS2, MoSe2, MoTe2, and WS2 bilayer structures continuously decreases with increasing applied electric fields, eventually rendering them metallic. We interpret our results in the light of the giant Stark effect and obtain a robust relationship, which is essentially characterized by the interlayer spacing, for the rate of change of band gap with applied external field. Our study expands the known space of layered materials with widely tunable band gaps beyond the classic example of bilayer graphene and suggests potential directions for fabrication of novel electronic and photonic devices.
引用
收藏
页数:10
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