A new Patterning method using photocatalytic lithography and selective atomic layer deposition

被引：102

作者：

Lee, JP ^{[1
]}

Sung, MM ^{[1
]}

机构：

[1] Kookmin Univ, Dept Chem, Seoul 136702, South Korea

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2004年 / 126卷 / 01期

关键词：

D O I：

10.1021/ja038769+

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

[No abstract available]

引用

页码：28 / 29

页数：2

共 19 条

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