Development of a non-toxic electrolyte for soft gold electrodeposition: an overview of work at University of Newcastle upon Tyne

被引:57
作者
Liew, MJ [1 ]
Roy, S [1 ]
Scott, K [1 ]
机构
[1] Newcastle Univ, Sch Chem Engn & Adv Mat, Merz Court, Newcastle Upon Tyne NE1 7RU, Tyne & Wear, England
关键词
D O I
10.1039/b301176n
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Electroplated soft gold is widely used in the growing fields of micro- and opto-electronics as a conducting material for interconnects and devices. Due to problems related to resist compatibility, safety and disposal concerns, cyanide-free plating baths are now strongly in demand. The interest in developing non-toxic gold electrolytes, such as those based on sulfite complexes, has grown rapidly in recent years. The most common non-cyanide gold electrolyte is based on a gold-sulfite complex, which has problems related to stability and resist compatibility. Recently, a novel electrolyte that can be used for soft gold deposition, and is suitable for the formation of microbumps on wafers for electronic applications has been proposed. This bath, containing both thiosulfate and sulfite as complexing agents, is non-toxic, stable on storage and operation, and does not contain any chemical additives or stabilisers. At Newcastle University, we have tested this electrolyte for long term stability, suitability for large scale production, and recyclability (by electrowinning). We have reported the performance of this electrolyte here in this review.
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收藏
页码:376 / 381
页数:6
相关论文
共 36 条
[1]  
ANDO S, 1997, P 20 IEEE INT EL MAN, P220
[2]   ELECTROCHEMICAL AND STRUCTURAL ASPECTS OF GOLD ELECTRODEPOSITION FROM DILUTE SOLUTIONS BY DIRECT CURRENT [J].
CHEH, HY ;
SARD, R .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (11) :1737-&
[3]  
Christie I. R., 1994, GOLD BULL, V27, P12, DOI DOI 10.1007/BF03214728
[4]   LOW-STRESS GOLD ELECTROPLATING FOR X-RAY MASKS [J].
CHU, W ;
SCHATTENBURG, ML ;
SMITH, HI .
MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) :223-226
[5]   A NEW OPERATING REGIME FOR ELECTROPLATING THE GOLD ABSORBER ON X-RAY MASKS [J].
DAUKSHER, WJ ;
RESNICK, DJ ;
JOHNSON, WA ;
YANOF, AW .
MICROELECTRONIC ENGINEERING, 1994, 23 (1-4) :235-238
[6]   THE EFFECT OF ARSENIC UPON THE HARDNESS OF ELECTRODEPOSITED GOLD [J].
DINAN, TE ;
CHEH, HY .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (02) :410-412
[7]  
ENDICOTT DW, 1985, PLAT SURF FINISH, V69, P58
[8]  
Gabe DR, 1997, T I MET FINISH, V75, pB131
[9]  
GEMMLER A, 1994, PLAT SURF FINISH, V81, P52
[10]  
GREEN TA, 2003, IN PRESS J ELECTROCH